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Multiple detectors are installed in the integrating sphere to perform measurement over a wide range of wavelengths, from ultraviolet to visible to near infrared regions. The changes in photometric values at detector switching (from signal level differences) are minimized due to a design utilizing Hitachi’s expertise in integrating sphere construction, signal processing technologies, etc.
The UH4150 adopts a prism-grating (P-G) double monochromator optical system, continuing the established reputation of the U-4100 optical system. Large changes in light intensity of the S and P polarization are less likely for the prism-grating (P-G) system than for the generally used grating-grating (G-G) system. The UH4150 offers low noise measurements, even for low transmittance and reflectance samples.
The incident angle is important for the measurement of specular reflectance of solid samples. For focused light beam, the incident angle varies depending on the lens’s focal length, etc. Consequently, the values of simulation of design of optical thin films, such as dielectric multilayer film and prism, would differ from actual measured values. In the case of a collimated light beam, however, the incident angle is always the same with respect to the sample, leading to a highly accurate measurement of specular reflectance. Moreover, the collimated light beam is useful for the evaluation of diffusivity (haze) and the measurement of transmittance of lenses.
While maintaining the high-performing optical system of the model U-4100, the UH4150 provides higher throughput measurements. In the previous model, a scan speed of 600 mm/min was necessary for a measurement using a data interval of 1 nm. With Model UH4150, you can measure at 1 nm intervals while using a scan speed of 1,200 nm/min, reducing the measurement time significantly.*
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The UH4150 measures from 240 to 2,600 nm in approximately two minutes. It is effective for samples requiring measurement in UV-VIS-NIR wavelength range, such as Solar Reflective Materials.
We have taken three popular peripheral systems for the UH4150 spectrophotometer—the automatic variable-angle absolute reflectance measurement system, the automatic polarization measurement systems, and 5 Degrees reflectance/transmittance measurement system with automatic X-Y stage—and converted them into standalone systems that can be purchased individually.
60 mm Standard Integrating Sphere (for both total reflectance and diffuse reflectance) (P/N
1J1-0120)
Specifications
Incident angle
Wavelength range
240 - 2,600 nm
The Optical Thin-Film is an essential technology for optical components such as camera, lens of glasses, projector and mirror.
The accurate evaluation of optical characteristics is becoming more and more important for advanced development and quality control of optical components.
Measurement of Optical Characteristic of Plastic by UH4150 Spectrophotometer
- An example of High Throughput measurements in the UV, Visible and Near-Infrared Regions - (PDF, 207KB)
Plastic is a highly transparent, light, and durable material. For the optical evaluation of an object, such as light transmittance property, color, and transparency, the transmission spectrum and reflectance spectrum are measured by a spectrophotometer. These measurements do not only provide the optical information but also the information related to optical functions such as UV and infrared ray shieling levels. This time, the optical properties of various plastic materials were measured by using UH4150 spectrophotometer, the new model developed focusing on the photometric accuracy for solids such as optical materials. UH4150 is the spectrophotometer which inherited the optical system of U-4100 having an established reputation for its parallel beam and low polarization property that are suitable for the optical material evaluation. It is possible to change the detector and accessories depending on the analytical applications to meet various analytical requirements. Higher throughput, compared with the conventional instrument, was achieved and the analysis with the scan speed of 1,200nm/min for the sampling interval of 1 nm is possible. For example, for the wavelength range of the analysis introduced this time, the measurement can be completed in about 2 minutes.
Measurement Method of High Absorbance (Low Transmittance) Samples by UH4150 (PDF, 320KB)
With UH4150, a detector can be selected depending on the analysis purpose. When analyzing a solid sample which doesn’t contain any diffuse components, by selecting the direct light detector, the measurement of high absorbance can be performed with less noise, compared with the integrating sphere detector. One of the methods to measure high absorbance with a good accuracy is to use an attenuator. The standard installation of UH4150 includes the 1/100 attenuator. By using it in combination with the additional 1/100 attenuator in the sample chamber (on the reference side), the attenuation equivalent to that by a 1/10000 attenuator can be obtained and the measurement of very high absorbance (6 .7) becomes possible.
This time, using a light shielding apparatus as examples, the method for high absorbance analysis is introduced here.
Measurement Reproducibility of the Dielectric Multilayer by UH4150 Spectrophotometer - Comparison with the Lens Optical System of GG System - (PDF, 139KB)
The features of Model UH4150 include the installation of PG (prism-grating) monochromator and the application of collimated light beam. With the PG monochromator system, the change in the polarization characteristic is smooth and a stable baseline can be obtained. The collimated light beam compared with the focused light beam, the light beam rarely changes regardless of the sample resetting. As a result, a high measurement reproducibility can be obtained. This time, the transmission spectrum (incident angle of 0 degree, 5 times resetting) of a dielectric multilayer substrate was obtained. The reproducibility was compared with that of the generally used GG (grating-grating) system spectrophotometer in the same instrument class.
Determination of the Average Aspect ratio of Gold Nanorods (GNRs) using UH4150 UV-VIS-NIR Spectrophotometer (PDF, 163KB)
Au nanorods are rod-shaped gold nano-particles. Since the shape of the rods (aspect ratio) controls the light absorption specificities, their application is currently under development to manufacture gold-particles to probe DNA or optical memory materials.
Normally the aspect ratios of Au nanorods are determined by image-measurement using the transmission electron microscope (TEM). However, the aspect ratios of rods can easily be determined by measuring the peak location of the surface plasmon bands originating from the major-axis at around 900 nm.1) (Au nanorods have 2 surface plasmon bands along the major- and minor-axes originating from surface plasmon oscillation, as opposed to Au nano-particles that normally have only one surface plasmon band at around 520 nm. The absorption of Au nanorods is at around 520 nm for minor-axis and 900 nm for major-axis.) Peak location is derived from formula 1 based on the aspect ratio (R) of Au nanorods. Formula 2 will be obtained by solving formula 1 for the aspect ratio (R).
In this study, the aspect ratios were calculated from the absorption spectrum of Au nanorods using the UH4150 Spectrophotometer and in comparison with the values obtained from TEM images.
1) S. Link, M. A. El-Sayed, J. Phys. Chem, Vol.109, No.20, 10531 (2005)